Ultrasonic Cleaning for semiconductor components

Ultrapure water for ultrasonic cleaning machines is water that has undergone extensive purification to remove impurities and contaminants.In view of our client's ultrasonic cleaning application, Asia Supply designed and commissioned a cutting-edge 500L/hour ASTM type I water system to fulfil this requirement. The reverse osmosis system generates a high-quality feed water for the mixed-bed resin system, effectively removing a wide range of impurities and contaminants. Total organic carbon (TOC) and ultraviolet (UV) irradiation were also introduced to eliminate organics and germicidal bacteria. This water is of the highest quality, with almost all ions, minerals, and particles removed. Ultrapure water ensures optimal performance of ultrasonic cleaning machines by preventing the buildup of residue and ensuring thorough cleaning without leaving any streaks or marks on surfaces. It enhances the effectiveness of the ultrasonic cleaning process, resulting in sparkling clean items with minimal risk of contamination or damage.